Integrated nano-optic devices based on immersion nano-gratings made by imprint lithography and nano-trench-filling technology

jian wang,xuegong deng,paul sciortino,ron thomas varghese,anguel nikolov,feng liu,xiaoming liu,lei chen
DOI: https://doi.org/10.1117/12.615951
2005-01-01
Abstract:Nano-optic retarders and polarizers based on dielectric and metal nano-gratings were fabricated by UV-nanoimprint lithography. Different from conventional nanostructure-based optical devices, atomic layer deposition, a highly uniform and conformal deposition process, were utilized to fill trenches of the both dielectric and metal nano-gratings. The resulted immersion nano-grating design opens a path for innovative nano-grating based optical devices and integrated optical devices. As an example, a high-performance fully-buried aluminum nanowire-gird polarizer was developed which allowed us to achieve a monolithically integrated visible circular polarizer. The ability to integrate multiple nanostructure-based optical layers opens a path for innovative integrated optical devices as well as a new strategy for driving both miniature and cost.
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