High-speed two-photon lithography based on femtosecond laser
Yang Shunhua,Ding Chenliang,Zhu Dazhao,Yang Zhenyao,Liu Yong,Kuang Cuifang,Liu Xu
DOI: https://doi.org/10.12086/oee.2023.220133
2023-01-01
Abstract:Two-photon polymerization （TPP） based on femtosecond laser has been a research hotspot in 3D micro/nano writing technology.With the increasing demand for processing complex and large-scale miniaturized 3D devices in the fields of life science,material engineering,micro and nano optics,and etc.,the issue of low processing efficiency of TPP is becoming increasingly serious.During the long fabrication period,many disturbances can be introduced in the processing,causing the quality deterioration of the structure and seriously hindering the further popularization and application of these crucial 3D devices.This paper respectively compares the four approaches of single-beam writing,parallel multi-beam writing,pattern projection,and 3D projection exposure based on the TPP lithography efficiency.Moreover,the researches on the optical design of system,the writing accuracy,the fabrication throughput,the writing strategy,and etc.of each approach are also described.And the advantages and disadvantages of these four methods are summerized simultaneously.Finally,we also made a brief prospect to the developing trend of TPL efficiency improvement in the future.