Deep Understanding of Oxide Defects for Stochastic Charging in Nanoscale MOSFETs

Yingxin Qiu,Runsheng Wang,Jingwei Ji,Ru Huang
DOI: https://doi.org/10.1109/snw.2014.7348569
2014-01-01
Abstract:In nanoscale devices, trapping and de-trapping of single carrier charge caused by few defects in ultrathin gate dielectrics can affect the drain current significantly [1-4]. The oxygen vacancy in gate oxides is mostly considered as the criminal defect [1]. Recently, the stochastic charge trapping or dynamic behaviors (charging and discharging) of defect and its frequency dependence have been paid much attention with experiments [1-6]. The concept of metastable states of defect has been proposed for explaining its complete dynamics [1,5-9]. However, the atomistic origin of the stochastic single-charge trapping behavior and the missing metastable states are still not clear. In this paper, the stochastic defect transitions in SiO 2 and HfO 2 gate dielectrics are investigated by using ab-initio simulation of atomistic defect model, and the possible metastable defect states are directly obtained from climbing nudged elastic band simulation.
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