A Hybrid Resist Hemispherical-Pit Array Layer for Light Trapping in Thin Film Silicon Solar Cells Via UV Nanoimprint Lithography

Peihua Wangyang,Yanchang Gan,Qingkang Wang,Xuesong Jiang
DOI: https://doi.org/10.1039/c4tc00605d
IF: 6.4
2014-01-01
Journal of Materials Chemistry C
Abstract:Micromorph tandem solar cells coated with a HP array layer were fabricated by UV NIL. The HP array layer could reduce the average reflectance of the solar cells from 7.7% to 1.8%. And a relative improvement of efficiency of up to 4.1% is observed as compared to the bare solar cells.
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