Abstract:Graphene offers exceptional properties, such as ultra-high carrier mobility, near-ballistic transport characteristics, and ultra-high-frequency operational response, making it an ideal material for radio-frequency devices and high-speed optical communications. To realize its potential applications, high-quality graphene films must be integrated onto target substrates with reliability, uniformity, and scalability. Despite significant progress in the chemical vapor deposition of high-quality graphene on catalytic metal substrates, the transfer of such films onto application-targeted substrates remains necessary for large-scale technological use, but it faces challenges like contaminations and cracks. Graphene's flexibility and single-atom thickness make it vulnerable to damage and folding during the transfer process due to force disturbances and uneven force distribution. Traditional graphene transfer methods employ organic polymers as a medium and remove them using organic solvents after transferring graphene onto the desired substrates. However, this repetitive process generates organic waste and leaves unavoidable contamination due to the limited solubility of the polymer. Furthermore, selective interlacing of organic solvents during polymer removal can detach graphene from the substrate and cause cracks. In this study, we demonstrate a novel approach to address these issues. Instead of using organic polymers, we directly use the photoresist as the transfer medium to mechanically delaminate graphene from the metal growth substrate onto the targeted substrate. By doing so, we eliminate the need for repeated polymer coating on the graphene surface, enabling successful transfer without crack formation, wrinkles, or unintentional doping. The strong interaction between graphene and the photoresist, coupled with the weakened interaction between graphene and the growth substrate due to oxidation, ensures crack-free delamination. Moreover, the photoresist serves as a patterned mask plate for exposure, etching, and other subsequent device fabrication processes. As a result, the electrical properties of graphene are improved, achieving an average carrier mobility of 6200 cm(2)center dot V-1 center dot s(-1). This integrated approach not only enhances the device performance of two-dimensional materials but also paves the way for future applications of such materials in electronics and photonics. In conclusion, our method offers a promising solution for the successful transfer and device fabrication of graphene, enhancing its potential in the field of electronics and photonics.

Support-Free Transfer of Ultrasmooth Graphene Films Facilitated by Self-Assembled Monolayers for Electronic Devices and Patterns

A Scalable Polymer-Free Method for Transferring Graphene Onto Arbitrary Surfaces

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Transfer of graphene onto arbitrary substrates via sublimable carrier

Crack-Free Transfer of Graphene Wafers Via Photoresist As Transfer Medium

Transfer of Cvd-Grown Monolayer Graphene Onto Arbitrary Substrates

Transfer of Large-Area Graphene Films for High-Performance Transparent Conductive Electrodes

Wafer-scale synthesis and transfer of graphene films

Rapid and Scalable Transfer of Large‐area Graphene Wafers

Large-area transfer of two-dimensional materials free of cracks, contamination and wrinkles via controllable conformal contact

Surface tension traction transfer method for wafer-scale device grade graphene film

High-quality and efficient transfer of large-area graphene films onto different substrates

Wetting‐Induced Climbing for Transferring Interfacially Assembled Large‐Area Ultrathin Pristine Graphene Film

Transfer-Free Batch Fabrication of Large-Area Suspended Graphene Membranes

Scalable and High-Quality Monolayer Graphene Transfer Onto Polymer Membranes Assisted by Camphor

Method for Transferring High-Mobility CVD-Grown Graphene with Perfluoropolymers

UV-Epoxy-Enabled Simultaneous Intact Transfer and Highly Efficient Doping for Roll-to-Roll Production of High-Performance Graphene Films

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A Double Support Layer for Facile Clean Transfer of Two-Dimensional Materials for High-Performance Electronic and Optoelectronic Devices

Face-to-face transfer of wafer-scale graphene films

Ultraclean Transfer of Graphene by Mechanically Exfoliating Polymer with Modified Crosslink Density