Dynamical chaos in chip-scale optomechanical oscillators
Jiagui Wu,Shu-Wei Huang,Yongjun Huang,Hao Zhou,Jinghui Yang,Jia-Ming Liu,Mingbin Yu,Guo-Qiang Lo,Dim-Lee Kwong,Guang-Qiong Xia,Chee Wei Wong
DOI: https://doi.org/10.1038/ncomms15570
2016-01-01
Abstract:Chaos has revolutionized the field of nonlinear science and stimulated foundational studies from neural networks, extreme event statistics, to physics of electron transport. Recent studies in cavity optomechanics provide a new platform to uncover quintessential architectures of chaos generation and the underlying physics. Here we report the first generation of dynamical chaos in silicon optomechanical oscillators, enabled by the strong and coupled nonlinearities of Drude electron-hole plasma. Deterministic chaotic oscillation is achieved, and statistical and entropic characterization quantifies the complexity of chaos. The correlation dimension D2 is determined at ~ 1.67 for the chaotic attractor, along with a maximal Lyapunov exponent rate about 2.94*the fundamental optomechanical oscillation. The corresponding nonlinear dynamical maps demonstrate the plethora of subharmonics, bifurcations, and stable regimes, along with distinct transitional routes into chaotic states. The chaos generation in our mesoscopic platform provides for the first time a solid-state silicon architecture to expand the scope of nonlinear dynamics science.