Highly Sensitive Phototransistor Based on GaSe Nanosheets

Hai Huang,Peng Wang,Yanqing Gao,Xudong Wang,Tie Lin,Jianlu Wang,Lei Liao,Jinglan Sun,Xiangjian Meng,Zhiming Huang,Xiaoshuang Chen,Junhao Chu
DOI: https://doi.org/10.1063/1.4933034
IF: 4
2015-01-01
Applied Physics Letters
Abstract:Phototransistors based on two dimensional semiconductors have drawn increasing attention in recent years. GaSe is a typical semiconductor with a layered structure. In this work, the ultrathin GaSe nanosheets were exfoliated from commercially available crystals using a micromechanical cleavage technique. Then, the nanosheets were used to fabricate field effect transistors (FETs) on Si/SiO2 substrates with interdigitated electrodes. The electrical and optoelectronic properties of the FET were characterized. The phototransistor based on a GaSe nanosheet had a high photoresponsivity (∼2200 mA/W) and a high Iphoto/Idark (photoresponse current over dark current) ratio of almost 103.
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