Enhanced Light Extraction of Scintillator Using Large-Area Photonic Crystal Structures Fabricated by Soft-X-Ray Interference Lithography

Zhichao Zhu,Shuang Wu,Chaofan Xue,Jun Zhao,Liansheng Wang,Yanqing Wu,Bo Liu,Chuanwei Cheng,Mu Gu,Hong Chen,Renzhong Tai
DOI: https://doi.org/10.1063/1.4922699
IF: 4
2015-01-01
Applied Physics Letters
Abstract:Soft-X-ray interference lithography is utilized in combination with atomic layer deposition to prepare photonic crystal structures on the surface of Bi4Ge3O12 (BGO) scintillator in order to extract the light otherwise trapped in the internal of scintillator due to total internal reflection. An enhancement with wavelength- and emergence angle-integration by 95.1% has been achieved. This method is advantageous to fabricate photonic crystal structures with large-area and high-index-contrast which enable a high-efficient coupling of evanescent field and the photonic crystal structures. Generally, the method demonstrated in this work is also suitable for many other light emitting devices where a large-area is required in the practical applications.
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