Engineering Nonlinearity into Memristors for Passive Crossbar Applications

J. Joshua Yang,M. -X. Zhang,Matthew D. Pickett,Feng Miao,John Paul Strachan,Wen-Di Li,Wei Yi,Douglas A. A. Ohlberg,Byung Joon Choi,Wei Wu,Janice H. Nickel,Gilberto Medeiros-Ribeiro,R. Stanley Williams
DOI: https://doi.org/10.1063/1.3693392
IF: 4
2012-01-01
Applied Physics Letters
Abstract:Although TaOx memristors have demonstrated encouraging write/erase endurance and nanosecond switching speeds, the linear current-voltage (I-V) characteristic in the low resistance state limits their applications in large passive crossbar arrays. We demonstrate here that a TiO2-x/TaOx oxide heterostructure incorporated into a 50 nm× 50 nm memristor displays a very large nonlinearity such that I(V/2) ≈ I(V)/100 for V ≈ 1 volt, which is caused by current-controlled negative differential resistance in the device.
What problem does this paper attempt to address?