A Simple, Low-Cost CVD Route to Thin Films of BiFeO3 for Efficient Water Photo-Oxidation

Savio J. A. Moniz,Raul Quesada-Cabrera,Christopher S. Blackman,Junwang Tang,Paul Southern,Paul M. Weaver,Claire J. Carmalt
DOI: https://doi.org/10.1039/c3ta14824f
IF: 11.9
2014-01-01
Journal of Materials Chemistry A
Abstract:A novel method for preparation of BiFeO3 films via a simple solution-based CVD method is reported using for the first time a single-source heterobimetallic precursor [CpFe(CO)(2)BiCl2]. BiFeO3 films display ferroelectric and ferromagnetic ordering at room temperature and possess direct band-gaps between 2.0 and 2.2 eV. Photocatalytic testing for water oxidation revealed high activities under UVA (365 nm) and simulated solar irradiation, superior to that exhibited by a commercial standard (Pilkington Activ (R) TiO2 film) resulting in an apparent quantum yield of similar to 24%.
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