Design and Fabrication of Far Ultraviolet Filters Based on Π-Multilayer Technology in High-K Materials

Xiao-Dong Wang,Bo Chen,Hai-Feng Wang,Fei He,Xin Zheng,Ling-Ping He,Bin Chen,Shi-Jie Liu,Zhong-Xu Cui,Xiao-Hu Yang,Yun-Peng Li
DOI: https://doi.org/10.1038/srep08503
IF: 4.6
2015-01-01
Scientific Reports
Abstract:Application of π-multilayer technology is extended to high extinction coefficient materials, which is introduced into metal-dielectric filter design. Metal materials often have high extinction coefficients in far ultraviolet (FUV) region, so optical thickness of metal materials should be smaller than that of the dielectric material. A broadband FUV filter of 9-layer non-periodic Al/MgF2 multilayer was successfully designed and fabricated and it shows high reflectance in 140–180 nm, suppressed reflectance in 120–137 nm and 181–220 nm.
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