CMOS-compatible highly efficient polarization splitter and rotator based on a double-etched directional coupler.

Hang Guan,Ari Novack,Matthew Streshinsky,Ruizhi Shi,Qing Fang,Andy Eu-Jin Lim,Guo-Qiang Lo,Tom Baehr-Jones,Michael Hochberg
DOI: https://doi.org/10.1364/OE.22.002489
IF: 3.8
2014-01-01
Optics Express
Abstract:We present a highly efficient polarization splitter and rotator (PSR), fabricated using 248 nm deep ultraviolet lithography on a silicon-on-insulator substrate. The PSR is based on a double-etched directional coupler with a length of 27 mu m. The fabricated PSR yields a TM-to-TE conversion loss better than 0.5 dB and TE insertion loss better than 0.3 dB, with an ultra-low crosstalk (-20 dB) in the wavelength regime 1540-1570 nm. (C) 2014 Optical Society of America
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