Abstract:The conventional photon and electron beam based lithographic techniques used for electronics and optics have been explored to pattern various vulnerable molecules that are interested in both chemistry and biology. Creating nanostructures over 1-1000 nm length scales with controlled size, shape and chemical compositions is essential for a wide variety of applications including electronics, optics, chip-based bioassays, and highthroughput screening. In recent development, new technologies have been invented to enable nanopatterning over large areas in low cost for practical device applications, such as interference photolithography, roll-to-roll nanoimprint lithography (R2R NIL), block copolymer nanolithography (BCPN), scanning-probe-based polymer pen lithography (PPL), and beam pen lithography (BPL). In this research topic we will discuss the approaches to macroscopic-area patterning of nanoscale features, including the direct patterning of inorganic or polymeric materials, the directed assembly of pre-synthesized functional materials into well-organized arrays, and the combination of different topdown and bottom-up patterning strategies for new capabilities. More importantly, we welcome discussions on the recent applications that are realized by these patterning tools, such as light management in solar cells, printed electronics, microbattery, information storage, 3D printings, stimuli-responsive surface architectures, sensors based on surfaceenhanced Raman scattering (SERS), biomolecular arrays, and studies on cell-material interactions.

The power of the pen: development of massively parallel dip-pen nanolithography.

Dip-Pen Nanolithography: Automated Fabrication of Custom Multicomponent Sub-100-Nanometer Surface Architectures

The Evolution Of Dip-Pen Nanolithography

The evolution of dip‐pen nanolithography

Beam Pen Lithography.

Dip-Pen Nanolithography: Controlling Surface Architecture on the Sub-100 Nanometer Length Scale

Cover Picture: the Evolution of Dip‐Pen Nanolithography (angew. Chem. Int. Ed. 1/2004)

Massively Parallel Dip–Pen Nanolithography with 55 000-Pen Two-Dimensional Arrays

Materials Integration by Dip‐Pen Nanolithography

Cantilever-free Techniques and Tools for Delivering Materials and Energy to Surfaces

Evolution of Dip-Pen Nanolithography (DPN): From Molecular Patterning to Materials Discovery

Desktop Nanofabrication with Massively Multiplexed Beam Pen Lithography

Zur Entwicklung Der Dip‐Pen‐Nanolithographie

Direct-Write Scanning Probe Lithography: Towards A Desktop Fab

Controlled Preparation of Inorganic Nanostructures on Substrates by Dip-Pen Nanolithography.

Development of Dip‐Pen Nanolithography (DPN) and Its Derivatives

Parallel Dip-Pen Nanolithography With Arrays Of Individually Addressable Cantilevers

Sub-100 nm, Centimeter-Scale, Parallel Dip-Pen Nanolithography

A Cantilever-Free Approach to Dot-Matrix Nanoprinting

Multiple Ink Nanolithography: Toward a Multiple-Pen Nano-Plotter

Moving Beyond Molecules: Patterning Solid-State Features Via Dip-Pen Nanolithography with Sol-Based Inks.