Saturated and Near-Diffraction-limited Operation of an XUV Laser at 23.6 Nm.

A CARILLON,HZ CHEN,P DHEZ,L DWIVEDI,J JACOBY,P JAEGLE,G JAMELOT,J ZHANG,MH KEY,A KIDD,A KLISNICK,R KODAMA,J KRISHNAN,CLS LEWIS,D NEELY,P NORREYS,D ONEILL,GJ PERT,SA RAMSDEN,JP RAUCOURT,GJ TALLENTS,J UHOMOIBHI
DOI: https://doi.org/10.1103/physrevlett.68.2917
IF: 8.6
1992-01-01
Physical Review Letters
Abstract:Amplification of spontaneous emission (ASE) at 23.6 nm has been studied in a Ge plasma heated by a 1 TW infrared laser pulse. The exponent of the axial gain reached 21 in a geometry with Fresnel number less-than-or-equal-to 1. Two plasma columns of combined length up to 36 mm were used with an extreme ultraviolet mirror giving double-pass amplification. Saturation of the ASE output was observed. The beam divergence was about 8 x diffraction limited with a brightness estimated at 10(14) W cm-2 sr-1. The feedback from the mirror was significantly reduced probably by radiation damage from the plasma.
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