Depinning of Domain Walls in Permalloy Nanowires with Asymmetric Notches
Y. Gao,B. You,X. Z. Ruan,M. Y. Liu,H. L. Yang,Q. F. Zhan,Z. Li,N. Lei,W. S. Zhao,D. F. Pan,J. G. Wan,J. Wu,H. Q. Tu,J. Wang,W. Zhang,Y. B. Xu,J. Du
DOI: https://doi.org/10.1038/srep32617
IF: 4.6
2016-01-01
Scientific Reports
Abstract:Effective control of the domain wall (DW) motion along the magnetic nanowires is of great importance for fundamental research and potential application in spintronic devices. In this work, a series of permalloy nanowires with an asymmetric notch in the middle were fabricated with only varying the width ( d ) of the right arm from 200 nm to 1000 nm. The detailed pinning and depinning processes of DWs in these nanowires have been studied by using focused magneto-optic Kerr effect (FMOKE) magnetometer, magnetic force microscopy (MFM) and micromagnetic simulation. The experimental results unambiguously exhibit the presence of a DW pinned at the notch in a typical sample with d equal to 500 nm. At a certain range of 200 nm < d < 500 nm, both the experimental and simulated results show that the DW can maintain or change its chirality randomly during passing through the notch, resulting in two DW depinning fields. Those two depinning fields have opposite d dependences, which may be originated from different potential well/barrier generated by the asymmetric notch with varying d .