Study on Liquid-Solid Electromigration in Cu/Sn-9Zn/Cu Interconnect Using Synchrotron Radiation Real-Time in Situ Imaging Technology

Mingliang Huang,Zhijie Zhang,Ning Zhao,Xiaofei Feng
DOI: https://doi.org/10.1109/icept.2013.6756438
2013-01-01
Abstract:Synchrotron radiation real-time in situ imaging technology was conducted to investigate the interfacial reaction in line-type Cu/Sn-9Zn/Cu interconnect under a current density of 1.2×10 4 A/cm 2 at 250°C. A reverse polarity effect, i.e., the intermetallic compound (IMC) layer at the cathode grew continuously while that at the anode was restrained, was observed in Cu/Sn-9Zn/Cu interconnects. With increasing liquid-solid electromigration (L-S EM) time, the initial interfacial Cu 5 Zn 8 gradually transformed into Cu 6 (Sn, Zn) 5 at the anode, while into a mixture of Cu 5 Zn 8 and Cu 6 (Sn, Zn) 5 at the cathode. This provided a clear evidence that Zn atoms were migrating from the anode toward the cathode undergoing L-S EM, which is different from the normal diffusion behavior of atoms. Since there is no back-stress undergoing L-S EM, it is deduced that the effective charge number (Z*) of Zn atoms became positive, resulting in the directional migration of Zn atoms from the anode toward the cathode under electron current stressing.
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