Abstract:Silicon-based optoelectronics, using the mature silicon-based microelectronic complementary metal oxide semiconductor (CMOS) manufacturing process, is a large-scale optoelectronic integration platform that has attracted much attention. Surface plasmonic devices have also received extensive attention in the past decades, and especially the silicon-based surface plasmonic nanofocusing devices have become a research hotspot. Typical nanofocusing structures include chirped surface gratings, plasmonic Fresnel zone plate, nano-slit array, tapered metal tips. However, there occur some inevitable problems in these devices, such as the fine structure being too complex to be fabricated and too large transmission loss of metal slot waveguide. In this work, an ultra-compact hybrid surface plasmon nanofocusing device is designed and fabricated by the silicon-based optoelectronic technology, and the nanofocusing performance of the device is also experimentally verified. The hybrid surface plasmon nanofocusing devices are fabricated on a silicon-on-insulator (SOI) wafer by electron beam lithography (EBL) system. The silicon wire waveguides, tapers and the thin silicon strips in the middle of nanofocusing regions are patterned in only one step EBL. The gold layer is formed by a deposition and lift-off process, and then a partially etching process is introduced to make the thickness of the middle thin silicon strips the same as that of the gold layer. With a 1.23-mu m-long tapered structure, our nanofocusing devices focus the light field of a silicon strip waveguide into a hybrid surface plasmon waveguide, making non-resonant optical field increase 20 times in the 1550 nm near-infrared band experimentally. The entire insertion loss is about 4.6 dB, and the mode area of the nanofocusing area is about (lambda/n)(2) / 6 40 which is over 300 times smaller than that of the input silicon waveguide. When the middle slot silicon waveguide width W-Si = 120 nm, the insertion loss reaches a minimum value of 2.8 dB. In our design, we adopt the design of silicon-based hybrid plasmonic waveguides. In this design, a layer of material with low refractive index is inserted between the metal layer and the silicon layer to act as a "container" of light field, which makes this silicon-based hybrid plasmonic waveguides have less loss than the traditional metal plasmonic waveguides, and can still maintain high optical field localization. Such silicon-based hybrid surface plasmon nanofocusing devices with simple structures and excellent performances are promising alternatives for future applications in optical field manipulation, optical sensing, nonlinear optical devices, and optical phase-change storage.

Horizontal nanoplasmonic slot waveguide-based subwavelength photonic components for on-chip integration

Silicon-based horizontal nanoplasmonic slot waveguides for on-chip integration.

Components for silicon plasmonic nanocircuits based on horizontal Cu-SiO₂-Si-SiO₂-Cu nanoplasmonic waveguides.

Metal-insulator-Si Hybrid Plasmonic Waveguide Components for On-Chip Photonics

Fully CMOS compatible subwavelength plasmonic slot waveguides for Si electronic-photonic integrated circuits

Experimental Demonstration of Horizontal Nanoplasmonic Slot Waveguide-Ring Resonators With Submicrometer Radius

Experimental Demonstration of Integrated Horizontal Cu-Si3N4-Cu Plasmonic Waveguide and Passive Components

Hybrid Dielectric-Loaded Plasmonic Waveguide-Based Power Splitter and Ring Resonator: Compact Size and High Optical Performance for Nanophotonic Circuits

Fully Complementary Metal-Oxide-Semiconductor Compatible Nanoplasmonic Slot Waveguides For Silicon Electronic Photonic Integrated Circuits

Experimental Demonstration of Vertical ${\rm Cu}\hbox{-}{\rm SiO}_{2}\hbox{-}{\rm Si}$ Hybrid Plasmonic Waveguide Components on an SOI Platform

Slot Waveguide Enhanced Field Confinement by CMOS-Compatible Hybrid Plasmonic Structures

Cu-insulator-Si hybrid plasmonic waveguide based CMOS-compatible Nanophotonic Devices

Waveguides Used for Nano- Photonic Circuits

Backside Nanoslot Excited Sub-Wavelength Grating-Coupled Cu-Strip Plasmonic Waveguides

Silicon nitride based plasmonic components for CMOS back-end-of-line integration

A Cmos-Compatible Hybrid Plasmonic Slot Waveguide with Enhanced Field Confinement

Characterization of Planar Hybrid Dielectric-Loaded Plasmonic Nano-Waveguides Used for Nano-Photonic Circuits

Speed-up electronic integrated circuits with plasmonic technology

High-Q and High-Order Side-Coupled Air-Mode Nanobeam Photonic Crystal Cavities in Silicon

Optical Performance Of Single-Mode Hybrid Dielectric-Loaded Plasmonic Waveguide-Based Components

Experimental research on ultracompact silicon hybrid plasmonic nanofocusing device