Abstract:Among the many ferroelectric film fabrication techniques, the sol-gel process provides high purity, large deposition area and easy composition control. However, the thickness limit of a crack-free single-layer film is about 0.2 mum and about 10 times of coating and thermal treatment processing are needed to deposit 1.5 mum-thick films. In laser ablation, the deposition rate is expected to be 1-2 mum/h, but the film quality is lower than that deposited by the sol-gel method. In this work, the hybrid process, involving the sol-gel method and laser ablation, was used to make 1.65 mum-thick lead zirconate titanate (PZT) films with well-crystallized perovskite phase at the (111) orientation. We deposited (111)-oriented 0.15 mum-thick PZT film on Pt/Ti/SiO2/Si substrates using the sol-gel method and then deposited 1.5 mum-thick PZT films by laser ablation. The remanent polarization of 28.6 muC/cm(2) and the coercive field of 58.0 kV/cm were obtained while the dielectric constant and loss values measured at 1 kHz were approximately 1050 and 0.045, respectively. The piezoelectric coefficient d(31) was also investigated and found to be 16.65 +/- 4 pC/N. In the application, a micromirror actuated by the hybrid PZT films was designed and fabricated successfully by a three-mask lithography process. The scanning angle of 6 2 degrees was demonstrated, while resonating with 5 V-p.p at the resonance frequency (1975 Hz).

Misted Deposition of [3D] Trenches for Drams and Frams III. PZT Thin Films and PZT Nanotubes

Characterization of Pb(Zr,Ti)O-3 Thin Film Prepared by Pulsed Laser Deposition

Pulsed Excimer Laser Deposition of Pb(Zr,Ti)O3thin Films on Simox Substrates

Preparation and characterization of lead zirconate titanate thick films prepared by chemical solution deposition for MEMS applications

Microstructure and Electrical Properties of Pb(Zr, Ti)O-3 Thick Film Prepared by Electrostatic Spray Deposition

Pb(Zr,Ti)O-3 Thin Films Prepared on Pbtio3/Si(100) by Chemical Solution Decomposition Technique

Epitaxial Pzt Films Deposited By Pulsed Laser Deposition For Mems Application

Fabrication And Characterization Of In-Plane Polarized Pzt Films With Interdigital Electrodes

Preparation of (001)-oriented PZT thick films on silicon wafer by pulsed laser deposition

Preparation and Application of Lead Zirconate Titanate (PZT) Films Deposited by Hybrid Process: Sol-Gel Method and Laser Ablation

Electrophoretic Deposition of Pb(Zr, Ti)O-3 Powder on Si Wafer: Morphological Change Across Film Thickness

Preparation of Pb(Zr0.52Ti0.48)O3 thin films on silicon-on-insulator substrates by excimer laser deposition combined with rapid thermal annealing

Structures and Properties of Pb(Zr,Ti)O3thin Films by Metallo-Organic Compound Decomposition Process

High Piezoelectricity of Pb(Zr,Ti)O3-based Ternary Compound Thin Films on Silicon Substrates

Characterization Of Nano-Particle (Pb,La)Tio3 Thin Films Prepared By Liquid Source Misted Chemical Deposition

High throughput physical vapor deposition growth of Pb(ZrxTi1-x)O3 perovskite thin films growth on silicon substrates.

Liquid Injection Ald of Pb(Zr,Ti)O-X Thin Films by A Combination of Self-Regulating Component Oxide Processes

Electrical and Mechanical Properties of PZT Thin Films Prepared by Hybrid Process of Sol-Gel Technique and Laser Ablation

Fabrication of Pzt Thin Films with Tiox Buffer Layers by Rf Magnetron Sputtering

The Microstructure and Ferroelectric Properties of PbZr0.52Ti0.48O3 Films on Mica Substrates

Preparation of Pb(Zr<sub>0.52</sub>Ti484848)O<sub>3</sub> thin films on silicon-on-insulator substrates by excimer laser deposition combined with rapid thermal annealing