Effect of magnetic field on high-voltage glow discharge during plasma implantation

Tian, X.B.,Yang, S.Q.,Fu, R.K.Y.,Chu, P.K.
DOI: https://doi.org/10.1109/PLASMA.2003.1229047
2003-01-01
Abstract:Summary form only given, as follows. In this paper, we report our findings on the effects on the magnetic field on the high-voltage glow discharge process.
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