One-step generating protect film resisting ozone and strong acid on conductive silicone adhesive with atmospheric pressure plasma-assisted

Van-Phuoc Thai,Kodai Igarashi,Kazumasa Takahashi,Toru Sasaki,Takashi Kikuchi
DOI: https://doi.org/10.1016/j.matchemphys.2023.128641
IF: 4.778
2024-01-01
Materials Chemistry and Physics
Abstract:Enhancing the oxidation resistance of conductive silicone adhesive is crucial for long-term stability in rich oxygen and high-temperature environments. Coating thin film featuring low oxygen permeability on the adhesive has been considered a reliable solution. However, the current processes of coating film require extra precursor materials and post-treatment. Here we demonstrated a simple process with atmospheric pressure plasma-assisted to coat SiO x C y thin film on the conductive silicone adhesive within minutes. Our results indicated that the coated thin film has strong oxidation resistance that protects the conductive silicone adhesive from oxidation by 0.1 M HCl solution within 7 days and exposure to ozone for 20 min. The film presented a strong hydrophobic property with a contact angle of 120°. The film’s chemical structure was detected mainly with Si 3 + : –[Si(R)(-O-)-O–]– and Si 4 + : [Si(-O-)2–O–]–. The coating process is simple, requires no precursor material, and does not change the original conductivity of the conductive adhesive.
materials science, multidisciplinary
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