Isolation Enhancement Between Two Low-Profile Patch Antennas for In-Band Full-Duplex Applications
Yue Hu,Wei Hao Chen,Mao Qin Wu,Liang Hua Ye,Fan Jiang,Jian-Feng Li,Duo-Long Wu
DOI: https://doi.org/10.1109/lawp.2024.3374368
IF: 4.2
2024-01-01
IEEE Antennas and Wireless Propagation Letters
Abstract:An enhanced isolation technique between two low-profile patch antennas is proposed. Two identical antennas are configured with two PCBs spaced at 0.206 λ 0 , where λ 0 is the free-space wavelength at 3.5 GHz. Every antenna is a rectangular patch with four slots and two vias, vertically fed with a coaxial probe. A decoupling strip embedded between two antennas and a slot on the ground improves isolation, which would not deteriorate the cross-polarization and backward radiation levels. Two-port impedance match and isolation characteristics are analyzed when the two-antenna spacing varies from 0.159 λ 0 to 0.252 λ 0 . The proposed antenna has a size of 0.817 λ 0 × 0.448 λ 0 × 0.038 λ 0 . The fabricated prototype is measured, and the results demonstrate that the -10 dB impedance bandwidths are 3.37–3.61 GHz (6.88%), the port-to-port isolation is more than 45.2 dB, the realized gains are 4.53 ± 0.35 dBi, and the average radiation efficiencies are more than 70%. Therefore, the measured results agree well with the simulated, making it a promising candidate for in-band full-duplex applications in 5G terminal scenes.