Thermally Robust Nanocellular Thin Films Of High-T-G Semifluorinated Block Copolymers Foamed With Supercritical Carbon Dioxide

Rui Zhang,Cedric Dutriez,Kenji Sugiyama,Takashi Ishizone,Hideaki Yokoyama
DOI: https://doi.org/10.1039/c0sm00736f
IF: 4.046
2011-01-01
Soft Matter
Abstract:Nanoscopic porous and cellular materials with high thermal stability are demanded for a variety of applications. We fabricated thermally robust nanocellular thin films using block copolymer templated carbon dioxide foaming (BCTCF). We synthesized semi-fluorinated block copolymers having a CO2-philic fluorine containing block and high glass transition temperature (T-g) blocks, such as poly[4(1-adamantyl)styrene-b-perfluorooctylethyl methacrylate] (P(AdSt-FMA)) and poly[alpha-methylstyrene-b-perfluorooctylethyl methacrylate] (P(AMSt-FMA)). In particular, PAdSt has a T-g close to 250 degrees C due to the bulky adamantyl group attached to the polystyrene backbone. Although high-T-g blocks (polymers) lack processability in general, CO2 effectively plasticizes and reduces the T-g of the high-T-g blocks, swells the fluorinated block domains, and leaves empty nanocells in the fluorinated block domains after CO2 was removed. We optimized process conditions, such as saturation temperature (T-s), CO2 pressure and depressurization temperature (T-d), to introduce nanoscopic cells in such high-T-g matrices, and achieved porosities as high as 0.25, average diameter about 20 nm and remarkable thermal robustness up to more than 200 degrees C.
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