Electrochemical Kinetics of Nanosized Ag and Ag2O Thin Films Prepared by Radio Frequency Magnetron Sputtering

Jian Xie,Nobuyuki Imanishi,Atsushi Hirano,Yashuo Takeda,Osamu Yamamoto,Xin-Bing Zhao,Gao-Shao Cao
DOI: https://doi.org/10.1007/s10008-010-1228-0
IF: 2.747
2010-01-01
Journal of Solid State Electrochemistry
Abstract:Ag and Ag2O thin films have been prepared by radio frequency magnetron sputtering on Cu substrates and have been characterized by X-ray diffraction, scanning electron microscope and atomic force microscope. The electrochemical performance of the thin films has been studied by galvanostatic cycling and cyclic voltammetry. The potential dependence of Li-ion chemical diffusion coefficients, \( {\widetilde{D}_{\text{Li}}} \), of the films has been determined by galvanostatic intermittent titration technique and electrochemical impedance spectroscopy. It is found that Li-ion chemical diffusion coefficients of the Ag film range from 10−16 to 3 × 10−14 cm2 s−1. The Ag/Li2O composite that is formed from Ag2O after the first cycle exhibits higher \( {\widetilde{D}_{\text{Li}}} \) values than the Ag film, especially at a low Li-intercalation content. The phase transitions in the two-phase region cause a significant decrease of chemical diffusion coefficients.
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