Simulation and experimental studies of FTO/WO3 and FTO/WO3/Ag thin film structures for electrochromic analysis deposited by DC & RF magnetron sputtering
Kumar, Kilari Naveen,Prakash, Nunna Guru
DOI: https://doi.org/10.1007/s10854-024-13396-5
2024-08-30
Journal of Materials Science Materials in Electronics
Abstract:In this work, DC & RF magnetron sputtering and COMSOL multiphysics were used to simulate and deposit WO 3 and WO 3 /Ag films, respectively. In the simulation cyclic voltammetry (CV) analysis was examined. The current density for the WO 3 /Ag films in comparison to the WO 3 film was displayed higher. Based on the simulation findings, the experiment was done using DC & RF magnetron sputtering to deposit WO 3 and WO 3 /Ag films. Scanning electron microscopy (SEM), X-ray diffraction (XRD), UV–vis spectrometer, and electrochemical analyzer were used to examine the structural, morphological, EC, and optical characteristics of the deposited films. The SEM study revealed a smooth surface for WO 3 films and WO 3 /Ag shows the grain of silver film. The XRD analysis of WO 3 films shows the amorphous nature and in WO 3 /Ag films silver peaks were shown. The bandgap value s were found to be 3.14 eV and 3.02 eV for WO 3 and WO 3 /Ag films, respectively. Comparing the WO 3 /Ag film to the WO 3 film, the cyclic voltammograms showed that the WO 3 /Ag film had the maximum current. In comparison to the WO 3 film (30 cm 2 C −1 ), higher coloring efficiency values were noted for the WO 3 /Ag film (48 cm 2 C −1 ). For the WO 3/ Ag film, less time is needed for the coloring ( tc = 2.2) and belching ( tb = 1.8 s). It was clear that compared to a single-component WO 3 film, the Ag-embedded WO 3 composite system performed noticeably better electroactively and electrochemically.
engineering, electrical & electronic,materials science, multidisciplinary,physics, condensed matter, applied