Solvent Response of Polymers for Micromachine Manipulation.

Ye Tian,Yong-Lai Zhang,Hong Xia,Li Guo,Jin-Feng Ku,Yan He,Ran Zhang,Bin-Zong Xu,Qi-Dai Chen,Hong-Bo Sun
DOI: https://doi.org/10.1039/c0cp02006k
2011-01-01
Abstract:A novel solvent responsive polymer micromachine has been successfully fabricated by two-photon photopolymerization (TPP) of methacrylate-based photoresists. The moving part of the micromachine could be easily driven by interfacial solvent polarity induced swelling and shrinking of the photopolymer networks. Furthermore, the driving performance of the micromachine could be precisely modulated by varying the laser scanning step length during fabrication.
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