Role of Oxygen Incorporation in Electronic Properties of Rubrene Films

Xin Song,Li Wang,Qitang Fan,Yuyu Wu,Hongming Wang,Chunmei Liu,Nianhua Liu,Junfa Zhu,Dongchen Qi,Xingyu Gao,Andrew T. S. Wee
DOI: https://doi.org/10.1063/1.3466914
IF: 4
2010-01-01
Applied Physics Letters
Abstract:The electronic properties of rubrene films exposed to oxygen have been studied by photoemission and x-ray absorption spectroscopies. Oxygen incorporation causes the highest occupied molecular orbital of rubrene to shift to a ∼1.0 eV deep level due to chemical bonds formed by the oxygen atoms with the carbon atoms within the tetracene backbone of rubrene molecules. Deformation of the molecular backbone induced by the C–O bonds destroys the delocalized nature of the molecular orbitals. The oxidized rubrene molecules in a single crystal are proposed to act as point defects that disturb the long-range periodicity and produce localized acceptor states.
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