Experimental study on main pulse power supply for dicharge produced plasma extreme ultraviolet source

贾兴 jia xing,王骐 wang qi,赵永蓬 zhao yongpeng,张潮海 zhang chaohai,刘春芳 liu chunfang,吕鹏 lu peng
DOI: https://doi.org/10.3788/HPLPB20102202.0388
2010-01-01
Abstract:Extreme ultraviolet lithography(EUVL) is regarded as one of the most promising next generation lithographies. Among all the EUVL system technologies, the extreme ultraviolet source is the key issue. Compared with other light sources, gas discharge-produced plasma extreme ultraviolet source has drawn much attention around the world for its advantages in many aspects. The main pulse power generator for the Z-pinch discharge produced plasma extreme ultraviolet source is described in this paper, the circuit topology is presented. The critical 3-stage magnetic pulse compression is emphasized, its parameters are presented in the paper. Moreover, a novel configuration of the final magnetic pulse compression unit is introduced. Experiment results show that each pulse compression effect meets the anticipated target, the peak value of the output voltage is 30 kV, the maximum output discharge current is 40 kA and the pulse width is 200 ns.
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