A high repetition rate nanosecond pulsed power supply for nonthermal plasma generation

Kefu Liu,Qiong Hu,Jian Qiu,Houxiu Xiao
DOI: https://doi.org/10.1109/TPS.2005.852404
IF: 1.368
2005-01-01
IEEE Transactions on Plasma Science
Abstract:The basic principles of high repetition rate nanosecond pulsed power supplies, the design, and the implementation are presented. Voltage pulses of 20-30 kV with a rise time of 30 ns, a pulse duration of 200 ns, a pulse repetition rate of 1-2 kHz, an energy per pulse of 0.5-1 J, and the average power up to 0.5-1 kW have been achieved with total energy conversion efficiency of 90%. The protective ci...
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