Preparation and Characterization of Nanoporous SiO2/PI Hybrid Film

TIAN Jing,ZHANG Jin,LIU Qing-ju,ZHU Zhong-qi,LIU Qiang,ZENG Kun-wei
DOI: https://doi.org/10.3321/j.issn:1001-9731.2009.05.047
2009-01-01
Abstract:The nanoporous SiO2/PI hybrid thin film were preparaed on silicon wafers via adoping base catalyzed TEOS sol-gel method,molecular template and spinning coating.The film were analyzed and characterized by DSC-TGA,FTIR,AFM,XRD and Atomic Profiler method.The results show that the nanoporous SiO2/PI hybrid thin film is porous and amorpgous which has good thermal stability and mechanical property.The average pore diameter is 68nm in one-layer film and 72nm in two-layer film.The average thickness of one-layer and two-layer film is 917 and 1288nm,respectively.
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