Interface Diffusion and Resistivity of Ni/Al Nanomultilayers

Liu Mingxia,Zhang Jianmin,Xu Kewei
DOI: https://doi.org/10.3321/j.issn:0412-1961.2008.03.019
IF: 1.797
2008-01-01
ACTA METALLURGICA SINICA
Abstract:In order to clarify the scale-dependent interface diffusion behavior, the resistivity (P) and the specular reflection coefficient (P) of Ni/Al nanomultilayers deposited by magnetron sputtering as a function of the periodic number (n), Ni/Al modulated ratio (R) and modulated period (L) have been characterized by Fuchs-Sondheimer (FS)-Mayadas-Shatzkes (MS) model. The results show that the rho value is independent of n. With decreasing of R and L, the increases and the rho value decreases. The observed scale dependence of the rho value reflects the size effect in the interface diffusion of metal nanomultilayers. Due to the nonsymmetrical. interdiffusion behavior, the mutual promotion effect in the interfaces only displays at the lower R and smaller L. Once the length scale is upon a critical value, this effect turns to be weakened and the interfacial diffusion becomes invisible.
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