PBS and XRD Study on Helium-Charged Nanocrystalline Titanium Film

PANG Hongchao,LUO Shunzhong,LONG Xinggui,AN Zhu,LIU Ning,DUAN Yanmin,WU Xingchun,PENG Shuming,YANG Benfu,WANG Peilu,SONG Yingmin,ZHENG Sixiao

DOI: https://doi.org/10.3321/j.issn:0253-3219.2008.01.014

2008-01-01

Nuclear Techniques

Abstract:Helium-charged nanocrystalline titanium films were deposited by He-Ar magnetron sputtering.The he- lium content,microstructure and average grain size of the nanocrystalline titanium films were studied by PBS(proton backscattering)and XRD(X-ray diffraction).The results indicated that under the same deposition parameters except the substrate temperature,which increased from 60℃to 350℃,the helium content decreased gradually from 38.6%to 9.2%and the grain size increased from 13.1 nm to 44.2 nm.When the flux ratio of He/Ar was 6,10,15 and 19,he- lium content of the films was 17.6%,47.2%,48.3%and 38.6%,respectively.The Bragg peak of(002)crystal plane in the film had a slight shift to of the left comparing with that of the pure Ti film,while Bragg peak of(100)crystal plane did not change.This indicated that the lattice parameter c increased but the lattice parameter a remained the same.With increasing helium content in the film,the diffraction peaks broadened and grain sizes decreased.These further indicated that the incorporation of helium has an inhibition function to the grain growth of the film.