Micro/Nano-Structure Direct-Write Technology Based on Near-Field Electrospinning

郑高峰,王凌云,孙道恒
DOI: https://doi.org/10.3969/j.issn.1672-6030.2008.01.005
2008-01-01
Nanotechnology and Precision Engineering
Abstract:Direct-write(DW) technology based on near-field electrospinning(NFES),which suits for flexible electronic manufacturing,was studied in the paper.An experimental system with cooperative move of electrode and collector was designed,by which the effects of electrospinning parameters and parameters matching on DW process were analyzed.DW process can be controlled well by shortening distance between electrode and collector.Solid probe tip with diameter of 25 μm and tube needle with inside diameter of 232 μm were used as spinneret for DW nano-structure with diameter of 50—500 nm and DW micro-structure with line width of 1—8 μm respectively.The results show that the line width of micro-structure increases with the increasing of moving speed of collector and concentration of PEO solution;while DW working voltage decreases with the increasing of moving speed of collector,and increases with the increasing of the distance between electrode and collector.The distance between two parallel micro-structures can be controlled ranging from 100 μm to 180 μm by harmonizing the moving speed of electrode and collector.
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