An ultra-compact polarization insensitive directional coupler

Yaocheng Shi,Srinivasan Anand,Sailing He
DOI: https://doi.org/10.1364/aoe.2008.sul4
2009-01-01
Abstract:We investigate the lag-effect in the dry etching process. In one etch step, asymmetric waveguides with a shallow groove in between can be fabricated. This special property can be utilized for the design of an ultra-compact polarization insensitive directional coupler. © 2008 Optical Society of America.
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