Apparel Pattern Modeling Based on Tabular Layouts of Article Characteristics

LI Xiang-shuo,QI Guo-ning,YANG Qing-hai,GU Xin-jian

DOI: https://doi.org/10.3969/j.issn.1006-5911.2007.05.005

2007-01-01

Abstract:To support the agile design for apparel customization,the tabular layouts of article characteristics(SML) was introduced into the apparel pattern modeling.Firstly,the method of pattern parameter analysis was illuminated,and the relationships between the control points of geometry model and the parameters were studied.Then the reuse pattern geometry model was established,and the extraction rules of the article characteristics was also discussed.To describe the pattern modeling and the reuse process,the logic framework of the apparel pattern modeling based on SML was constructed,and associations among the customs' individualized information,resource database and the matching rules were formally described.Supported by this logic framework,knowledge reuse and the pattern variant design were realized.Finally,an instance of the apparel pattern modeling and variant design for suit was given.