Study of low energy sputtering of Pt(111) surface by molecular dynamics simulation

Yan Chao,Haifeng Lü,Zhang Chao,Zhang Qing-Yu,C Yan,HF Lu,C Zhang,QY Zhang

DOI: https://doi.org/10.7498/aps.55.1351

IF: 0.906

2006-01-01

Acta Physica Sinica

Abstract:Low energy sputtering of Pt (111) surface by noble metal atoms with the incident energy in the range of 0.1-200 eV has been studied by molecular dynamics simulation. The atomic interaction potential with embedded atom method (EAM) was used in the simulation. It was found that the sputtering threshold energy is independent of the mass of the incident atom in the case of normal impact on the Pt (111) surface. When the incident energy is lower than the threshold energy, the behavior of incident atom can be regarded as deposition process. When the incident energy is higher than the threshold energy, however, the sputtering yield increases with the increase of the incident energy.. For the incident energy of 200 eV, the sputtering yield induced by various incident atoms approaches I or even higher. The results mean that the atom with incident energy higher than 200 eV mainly plays the role of sputtering. The probability of angular distribution of the sputtered atoms and the sputtering pattern are similar to the sputtering results with higher incident energy. We found that the sputtering yield is a function of the reduced energy of incident atom and the mass ratio of incident atom to target atom when the incident energy is higher than the threshold energy, which is different from the linear cascade theory based on the binary collision model. We suggest a new physical mechanism for low energy sputtering, where the reflection of incident atom by target atom dominates the sputtering process of surface atoms.