Influence on the Performance of CVD Diamond Films by Boronizing on Smooth Cobalt-cemented Tungsten Carbide

Wang Yong,Ma Yuping,Sun Fanghong,Zhang Zhiming,Chen Ming
DOI: https://doi.org/10.3321/j.issn:1004-132X.2006.05.028
2006-01-01
Abstract:Improving adhesion and roughness of diamond films on WC-Co substrates is the key factor in extensive applications of diamond films. A pretreatment way of boronizing on smooth cobalt-cemented tungsten carbide to improve adhesion and roughness of diamond films had been introduced. A surface layer of stable cobalt borides was formed, and this layer can effectively prevent the diffusion of the cobalt from the surface when diamond films were deposited. On the other hand, this kind of way can protect the fineness of substrate surface well. Results show that under premise of the good adhesion between substrate and diamond film, the roughness of diamond films has been improved effectively. It is of great significance for the industrialization of diamond films.
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