Transmittance and Electromagnetic Shielding of ITO Films Deposited at Low Temperature

yutao Wu,xiaolong Weng,longjiang Deng
DOI: https://doi.org/10.13922/j.cnki.cjovst.2006.05.008
2006-01-01
Abstract:ITO films were deposited at room temperature on water-cooled polymethylmethacrylate (PMMA) and polyethylene terephthalate (PET) substrates by RF magnetron sputtering. The ITO films were characterized with X-ray diffraction (XRD) and atomic force microscopy (AFM). The results show that the ITO film thickness significantly affects its characteristics, including surface microstructure, optical properties and electromagnetic shielding. For example, as the film thickness increases, the surface roughness and compactness change a great deal; the averaged transmittance and resistivity vary from 75% to 86% and 1 × 10-3 Ω·cm to 1 × 10-3 Ω·cm respectively. In addition, the shielding of the samples improves with the increase of the film thickness. High quality ITO films, with a high averaged visible transmittance of 86.41%, a low resistivity of 1.19 × 10-3 Ω·cm and good electromagnetic shielding have been successfully grown by carefully controlling the film thickness.
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