Design of an Ultra-fast Electron Diffraction System

Jianjun Wu,Jinshou Tian,Junfeng Wang,Wei Zou,Xiaofeng Sai,Baosheng Zhao,Yunquan Liu,Wenxi Liang,Jie Zhang
2006-01-01
Abstract:The designed electron diffraction system consists of an ultra-fast electron gun,a sample chamber,a readout system,a power supply system,and a vacuum system,and it bears such unique characteristics as high energy,high temporal resolution,and high detection capacity.The photocathode is of a 35 nm Ag film deposited on an MgF2 glass disk,and it is sensitive to ultraviolet light with wavelength of 266 nm.A magnetic lens is used to focus the electrons.Two pairs of electric deflection plates are used in the X and Y directions respectively to control the movement of the electrons,and one pair of them will act as a scanning plate while measuring the pulse width of electrons.The sample chamber is made of stainless steel,and in the middle of the chamber there is a specimen holder,capable of shifting in three dimensions and turning around its axis.The diffraction pattern recording system has a very high detecting efficiency,and even a single electron could be detected.A cascade MCP detector is used to ensure an electron gain reached to 104.The electron gun is in a vacuum system of 10-4 Pa.The whole gun is shielded by a μ-metal sheath.The designed temporal resolution of the ultra-fast electron diffraction system (UED) is about 358 fs.
What problem does this paper attempt to address?