Abstract:Refractive index inhomogeneity is one of the important characteristics of optical coating material, which is one of the key factors to produce loss to the ultra-low residual reflection coatings except using the refractive index inhomogeneity to obtain gradient-index coating. In the normal structure of antireflection coatings for center wavelength at 532 nm, the physical thicknesses of layer H and layer L are 22.18 nm and 118.86 nm, respectively. The residual reflectance caused by refractive index inhomogeneity (the degree of inhomogeneous is between -0.2 and 0.2) is about 200 ppm, and the minimum reflectivity wavelength is between 528.2 nm and 535.2 nm. A new numerical method adding the refractive index inhomogeneity to the spectra calculation was proposed to design the laser antireflection coatings, which can achieve the design of antireflection coatings with ppm residual reflection by adjusting physical thickness of the couple layers. When the degree of refractive index inhomogeneity of the layer H and layer L is -0.08 and 0.05 respectively, the residual reflectance increase from zero to 0.0769% at 532 nm. According to the above accuracy numerical method, if layer H physical thickness increases by 1.30 nm and layer L decrease by 4.50 nm, residual reflectance of thin film will achieve to 2.06 ppm. When the degree of refractive index inhomogeneity of the layer H and layer L is 0.08 and -0.05 respectively, the residual reflectance increase from zero to 0.0784% at 532 nm. The residual reflectance of designed thin film can be reduced to 0.8 ppm by decreasing the layer H of 1.55 nm while increasing the layer L of 4.94 nm.

Influence of Inhomogeneities on the Spectral Characteristics of Anti-Reflection Coatings

Influence of inhomogeneities on the spectral characteristics of AR coatings

A novel trilayer antireflection coating using dip-coating technique

Wide-angle Broadband Antireflection Coatings with Nano-Taper Hydrated Alumina Film.

Reduction of Coating Induced Polarization Aberrations by Controlling the Polarization State Variation

Rigorous analysis of the spatial dispersion effect in multilayer thin-film coatings.

Hard Antireflective Coatings in the Visible Band

Anti-reflection Coating at 550 Nm Fabricated by Atomic Layer Deposition

Analysis of coating-induced polarization aberrations based on Jones matrix

Accuracy Design of Ultra-Low Residual Reflection Coatings for Laser Optics

Spatial Dispersion of Optical Thin Films

Simulation Analysis of Optical Characteristics of Drude Inhomogeneous Coatings

Omnidirectional Sio2 Ar Coatings

Influence of interface layer on antireflection coating for laser optics

Hard antireflection coatings with enhanced mechanical properties based on gradient structure

Plasma-enhanced atomic-layer-deposited HfO 2 –SiO 2 nanolaminates for broadband antireflection coatings

Nanoroughness induced anti-reflection and haze effects in opaque systems

Reducing Light Scattering of Multilayer Dielectric High-Reflection Coatings Through Film System Optimization Design

Analysis and Fabrication of Antireflection Coating with Ultralow Residual Reflectance for Single Wavelength

Effect of Energy Monochromaticity and Interfacial Roughness on Multilayer Reflectivity

Infrared Polarization Model Optimization and Radiation Characteristics of Camouflage Coatings