Characteristics of A Plasma Sheath in A Radio Frequency Biased Voltage

Y Zhang,JY Liu,Y Liu,X Wang
DOI: https://doi.org/10.1063/1.1764507
IF: 2.2
2004-01-01
Physics of Plasmas
Abstract:The exact equations of a radio frequency (rf) sheath driven by rf-biased voltage are solved numerically. All of the sheath characteristics for an arbitrary rf frequency are obtained, including the time-dependent ion density distributions, the ion current density, and ion kinetic energy at the electrode. Moreover, the ion energy distributions (IEDs) impinging on the rf-biased electrode are calculated, which match the experiment result [M. A. Sobolewski, J. K. Olthoff, and Y. C. Wang, J. Appl. Phys. 85, 3966 (1999)] exactly. The results show that the rf frequency is a crucial parameter for determining the spatiotemporal characteristic and the shape of IEDs.
What problem does this paper attempt to address?