Study on the Mask Method for Measuring the Eye's Wavefront Aberration

高卫华,王肇圻,郭欢庆,母国光
DOI: https://doi.org/10.3321/j.issn:1005-0086.2004.11.023
2004-01-01
Abstract:The method for measuring the eye's wavefront aberration with a movable mask, based on the Hartmann-Shack (H-S) principle, has been investigated. The mask is implemented by an LCD and imaged on the lenslet array plane, by which we measure aberrations of an artificial eye. Masks corresponding to H-S systems with different sampling densities are designed and the maximum measurable wavefront aberrations in subapertures are increased to L2/f, 2 L2/f and 4 L2/f separately. The method solves the problem of spot dislocations and contiguities, where spots leave their subapertures, leading to an expansion of the dynamic range of H-S sensors.
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