Abstract:Purpose: To investigate the influence of eyelid position on wavefront aberrations.Methods: In study 1, the right eyes of 43 non-cyclopleged subjects were evaluated using the Complete Ophthalmic Analysis System (COAS) aberrometer. In study 2, the right eyes of the 23 cyclopleged subjects were evaluated using the Optical Pathway Difference Scan aberrometer. Measurements were made with wide-open and deliberately narrowed palpebral apertures in these subjects. In study 3, the influence of eyelashes on the COAS output was investigated in 20 subjects by placing artificial eyelashes in front of the eye, in close proximity to the natural eyelashes.Results: For study 1, the total root mean square (RMS) of the third- and fourth-order aberrations with the wide-open lids was significantly different from the narrowed lid position after the correction for multiple comparisons. There was a difference in the Zernike coefficient of the defocus (C4), 90/ 180 astigmatism (C5), vertical coma (C7) and spherical aberration terms (C12) between the narrowed and wide-open positions. For study 2, changes were observed with the narrowed lid position in the overall RMS of the third and fourth orders, and total coma aberrations, as well as the specific Zernike coefficients of the C5 and C7 terms. However, none of these changes were significant after the multiple comparison correction. The corneal topography also showed remarkable changes in the superior corneal zone. Placing artificial eyelashes in front of the eye significantly affected some Zernike terms and the RMS of the second and fourth orders, and total coma aberrations, for particular pupil sizes.Conclusions: Deliberate narrowing of the palpebral aperture can influence the wavefront aberrations significantly. The corneal curvature distortion in response to eyelid pressure may account for some of the effect on aberration change. Eyelashes interfering with the light path within the pupil zone distort the output from the COAS, causing significant errors.

Ocular aberration measurement with and without an aperture stop using a Shack-Hartmann wavefront sensor

Interferometry Measurement Of Parallel Optical Plate Wavefront

A New Type Shack-Hartmann Wavefront Sensor Using Liquid Crystal Display

Learning-based Shack-Hartmann Wavefront Sensor for High-Order Aberration Detection.

A new shack-hartmann type wavefront sensor using liquid crystal panels

Analysis On Relation Between Hartmann - Shack Wavefront Detection Error And Image Restoration Quality

The wavefront aberration analysis and testing accuracy evaluation for the large aberration aspheric system based on the best fit sphere - art. no. 68342V

The Wavefront Aberration Analysis and Testing Accuracy Evaluation for the Large Aberration Aspheric System Based on the Best Fit Sphere

[Agreement Measurement of Ocular Wavefront Aberrations with Three Different Aberrometers].

Influence Of Eyelid Position On Wavefront Aberrations

High-order Optical Vortex Position Detection Using a Shack-Hartmann Wavefront Sensor.

Large-Dynamic-Range Ocular Aberration Measurement Based on Deep Learning with a Shack–Hartmann Wavefront Sensor

Measurement and comparison of the optical performance of an ophthalmic lens based on a Hartmann-Shack wavefront sensor in real viewing conditions.

RGB Shack–Hartmann wavefront sensor

Statistical optimal parameters obtained by using clinical human ocular aberrations for high-precision aberration measurement

Evaluation of the Agreement Between a New Pyramid Wavefront Sensor Aberrometer and Scheiner-Smirnov Aberrometers

Study of the Effects Caused by Displacement of Wavefront Measurement

A Limitation of Hartmann-Shack System in Measuring Wavefront Aberrations for Patients Received Laser Refractive Surgery

Asclepion Shack-Hartmann Aberrometer in Measuring the Ower Order Aberration

Adaptive System for Ocular Wavefront Analysis With Subjective Refinement

Aberration-resistible Topological Charge Determination of Annular-Shaped Optical Vortex Beams Using Shack-Hartmann Wavefront Sensor