Adaptive Layou Partitioning for Dark Field Alternating Phase-Shift Mask Design

Wang Di,Wu Weimin,Hon Xuanglong,王迪,吴为民,洪先龙
DOI: https://doi.org/10.3321/j.issn:0253-4177.2004.07.005
2004-01-01
Abstract:A new partitioning methodology is presented to accelerate 130nm and beyond large-scale alternating phase-shift mask(Alt-PSM)design flow.This method deals with granularity self-adaptively.Phase conflicts resolution approaches are described and strategies guaranteeing phase-compatible during layout compaction are also discussed.An efficient CAD prototype for dark field Alt-PSM based on these algorithms is implemented.The experimental results on several industry layouts show that the tool can successfully cope with the rapid growth of phase conflict with good quality and satisfy lower resource consumption with different requirements of precision and speedup.
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