Characteristic Study On Vuv Laser Generated By Two-Photon Resonant Four Wave Mixing In Xenon

Qifeng Li,Hua Wang,Yong Shi,Jinghua Dai,Shilin Liu,Shuqin Yu,Xingxiao Ma
DOI: https://doi.org/10.3969/j.issn.1674-0068.2004.03.018
IF: 1.09
2004-01-01
Chinese Journal of Chemical Physics
Abstract:The character of tunable Vacuum-Ultraviolet (VUV) laser generated by two-photon resonant four wave difference frequency mixing in Xenon was studied. The intense VUV laser was generated in the wavelength range of 151 similar to 171 nm using 6P[1/2, 0] level of Xe atom as the two-photon resonant state. The pulse intensity of VUV laser was estimated to be 0.2 muJ, and the conversion efficiency relative to the wavelength-fixed laser was determined to be 0.1%. The line width of VUV laser was found to be 0.3 cm(-1) from the laser-induced fluorescence spectrum of A-X (0, 0) rotational line profiles of jet-cooled CO, which was much broader than those of the two employed dye lasers (0.1 cm(-1)), mainly due to the saturation broadening of Xe level by intense laser field. The dependencies of VUV intensity on Xe pressure and two dye laser intensities were also investigated in this experiment.
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