Self-assembly of Si and SiO x nanostructures

Y. J. Chen,J. B. Li,Y. S. Han,J. H. Dai
DOI: https://doi.org/10.1023/A:1014261602564
2002-01-01
Journal of Materials Science Letters
Abstract:Self-assembly of Si and SiOx nanostructures formed by a simple thermal evaporation method was reported. A catalyst coated quartz glass substrate was prepared and three different zones were identified in the quartz substrate. The variety in the morphology of the products formed in the different zones indicated a diversity of growth conditions.
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