Characterization of Cdznte Crystals by Resistivity Measurements and Chemical Etching

QR Hou,YB Chen,H Chen,YJ He,KY Liu
DOI: https://doi.org/10.1142/s0217984902004226
2002-01-01
Modern Physics Letters B
Abstract:CdZnTe crystals grown by the vertical Bridgman method were characterized by measuring their resistivity and chemical etching in the well-known Nakagawa etchant (3HF:2H(2)O(2):2H(2)O, vol./vol.). It was found that the resistivity of the CdZnTe crystals was between 4.33 x 10(3) and 8.50 X 10(6) Omegacm. Defect densities were much higher around the periphery of some CdZnTe samples due to the influence of mechanical stress caused by contact with the crucible walls during the CdZnTe crystal growth. The sizes of the high defect density region ranged from 1.8 to 2.8 mm. Such high defect density region should be eliminated in order to make high-quality radiation detectors or prepare the substrates for the epitaxial growth of HgCdTe.
What problem does this paper attempt to address?