Initial Deposition Mechanism of Electroless Nickel Plating on Magnesium Alloys

YH Xiang,WB Hu,XK Liu,CZ Zhao,WJ Ding
DOI: https://doi.org/10.1080/00202967.2001.11871356
2001-01-01
Transactions of the IMF
Abstract:In this paper: the initial deposition mechanism of electroless nickel plating (EN) on magnesium alloys was studied by X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM) and scanning auger microscopy (SAM). It was shown that the substrate became catalytically active after the surface oxide dissolved into the plating hath. which made the replacement reaction between the substrate and nickel ion happen. The results indicated that different F/O ratios caused different initial deposition rates. It was also found that nickel nucleated at the second phase of the substrate and beneath the fluoride film formed during activation. No phosphorus was found in the initial deposited nickel.
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