Quasi-LIGA process using multilayer photoresist technology

Zimin Sun,Litian Liu,Zhijian Li
1999-01-01
Abstract:LIGA process (synchrotron radiation lithography, galvanoforming and plastic molding) plays a very important role in the fabrication of microelectromechanical system. This paper presented a new quasi-LIGA process using multilayer photoresist technology. It can transfer the patterns onto the much thicker photoresist layer by common photolithography machine and large aspect ratio can be obtained.
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