Fractal description of the defect spatial distributions on the wafer of integrated circuits

Yue Hao,Chunxiang Zhu,Zhijing Liu
1996-01-01
Tien Tzu Hsueh Pao/Acta Electronica Sinica
Abstract:The defect spatial distributions on the wafer of IC' s are studied. Based on the research of the spatial cluster effect of defect, a novel number-fractional dimension for describing the defect spatial distributions is proposed and a constructive fractal model is obtained. The defect spatial distributions and cluster are analysed in detail and simulated by means of the fractal model, and the correct results are given. The model can express the functional yield accurately and lay the foundation of design for manufacturability of IC' s.
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