The Study And Analysis Of Near-Field Light Intensity

Ky Wang,Z Jin,Wh Huang
DOI: https://doi.org/10.1117/12.263073
1996-01-01
Abstract:In this paper a numerical simulation is used to calculate near-field intensity by ''split light beam.'' The calculation proves to be valid as we apply it to the plane wave. In the case of one dimension structure such as a compact disk sample, the near-field intensity profiles show a rather complicated structure. In many cases the nearfield intensity does not represent the actual surface profile. The near-field intensity is strongly modulated by the surface structure. When the distance between the sample and the probe becomes larger, some subtle perturbation is added to the intensity profile, and a shift between the surface and the intensity prole became more clear. The shift may cause some problems when we use the optical probe as a multi-function probe to do some lithograph work or to position. In this paper,a comparison between the calculation and experiment results was made.
What problem does this paper attempt to address?