Abstract:Capacitively coupled plasma driven by a very high frequency has attracted much attention due to its rather independent control of ion flux and energy. In this paper, Langmuir probe diagnostic technique is used to observe the evolution of plasma properties such as electron energy distribution function, electron temperature and density, etc. Our experiment is performed in capacitively coupled argon plasma driven by a 40.68 MHz frequency. Experimental results show that the electron energy probability function changes from bi-Maxwellian type to single-Maxwellian type and then to Druyvesteyn type with the increase of the discharge pressure. At a low gas pressure, the electron collisionless heating in bulk plasma leads to bi-Maxwellian type in electron energy possibility function (EEPF), which has a double temperatures structure in EEPF. As the gas pressure increases, the electrons with low energy are able to collide with the neutral species more frequently, thus they gain energies through collisional heating. Therefore, these electrons can overcome the dc ambipolar potential and the collisional heating becomes a main electron heating mechanism. Increasing the input power enhances the electron population with low energy. From the discharge center to the edge, electron population with low energy decreases clearly due to the dc ambipolar potential, and they are unable to reach an oscillating sheath where collisionless heating occurs. However, electron population with high energy is slightly increased. The result indicates that more uniform plasma can be achieved at a high gas pressure. Additionally, EEPFs are measured for different discharge gaps between electrodes. The change of electrode gap for the plasma leads to a transition of electron heating mode along the axial direction. In order to characterize the electron behavior further, we introduce the ratio of the cold electron density to hot electron density (alpha) and the ratio of cold electron temperature to hot electron temperature (beta). The ratios also show the proportional distributions of the cold and hot electron populations. The electrode gap has a great influences on alpha while little influence on beta. When the discharge gap between electrodes varies from 20 to 40 mm, alpha changes from 0.2 to 0.5 while beta has the same trend. Spatial distributions of electron density and temperature with low and high energy are also discussed.

Measurements of ion energy distributions in a dual-frequency capacitively coupled plasma for Ar/O2 discharges

Experimental investigation of ion energy distributions in a dual frequency capacitively coupled Ar/CF4 plasma

Experimental Investigations of Electron Density and Ion Energy Distributions in Dual-Frequency Capacitively Coupled Plasmas for Ar/Cf4 and Ar/O-2/Cf4 Discharges

Modulating Effects of the Low-Frequency Source on Ion Energy Distributions in A Dual Frequency Capacitively Coupled Plasma

Experimental and Numerical Investigations of Electron Density in Low-Pressure Dual-Frequency Capacitively Coupled Oxygen Discharges

Ion energy distribution functions in a dual-frequency low-pressure capacitively-coupled plasma: experiments and particle-in-cell simulation

Ion Energy and Angular Distributions in Planar Ar/O2 Inductively Coupled Plasmas: Hybrid Simulation and Experimental Validation

Numerical Study of Ion Energy and Angular Distributions in Dual-Frequency Capacitively Coupled CF4 Plasmas

Experimental Investigation of the Electron Impact Excitation Behavior in Pulse-Modulated Radio Frequency Ar/O2 Inductively Coupled Plasma

Influence of dual-frequency source powers on ion density and electron temperature in capacitively-coupled argon plasma

Phase Resolved Optical Emission Spectroscopy of Dual Frequency Capacitively Coupled Plasma

An Investigation of Ar Metastable State Density in Low Pressure Dual-Frequency Capacitively Coupled Argon and Argon-Diluted Plasmas

Spectroscopy Diagnostic of Dual-Frequency Capacitively Coupled Chf3/Ar Plasma

Comparison of 2d Hybrid Simulational and Experimental Results for Dual-Frequency Capacitively Coupled Argon Plasmas

Influence of Mixture Compositions on Ion Energy Distributions in Ar/N-2 Electron Cyclotron Resonance Plasma

Investigating the Plasma Parameters and Discharge Asymmetry in Dual Magnetron Reactive High Power Impulse Magnetron Sputtering Discharge with Al in Ar/O2 Mixture

Evolution of electron energy distribution function in capacitively coupled argon plasma driven by very high frequency

Low-frequency Dependence of Plasma Characteristics in Dual-Frequency Capacitively Coupled Plasma Sources

Experimental Investigations of the Plasma Radial Uniformity in Single and Dual Frequency Capacitively Coupled Argon Discharges

Experimental and Numerical Investigations on Time-Resolved Characteristics of Pulsed Inductively Coupled O-2/Ar Plasmas

Plasma uniformity in a dual frequency capacitively coupled plasma reactor measured by optical emission spectroscopy